Pure Tantalum Plate (UNS R05200, ASTM B708)
Tantalum is one of the most exotic metals that have everyday industrial applications. Tantalum plates are high-performance materials made from tantalum metal. Pure tantalum plates are highly valued in industries requiring exceptional corrosion resistance, high-temperature stability, and biocompatibility. Tantalum, a rare transition metal, is processed into plates for specialized applications where performance outweighs cost considerations.
Unique Properties of Tantalum Plate
- Corrosion Resistance: Tantalum plates can withstand exposure to a wide range of chemicals without corroding. This makes them ideal for chemical processing environments.
- High Melting Point: They have one of the highest melting points among metals, which ensures performance under extreme heat.
- Excellent Conductivity: Their conductivity makes them suitable for electronic applications, especially where heat resistance is crucial.
- Strength-to-Weight Ratio and Durability: Tantalum's density is about 16.4 g/cm³, contributing to its strength and durability. Tantalum plates have a high strength-to-weight ratio, offering robustness without excess weight. It's durable, even in demanding applications. This strength ensures long-term performance and reliability.
Chemical Composition
|
Element |
R05200 (%,Max) |
R05400 (%,Max) |
|
C |
0.01 |
0.01 |
|
O |
0.015 |
0.03 |
|
N |
0.01 |
0.01 |
|
H |
0.0015 |
0.0015 |
|
Fe |
0.01 |
0.01 |
|
Mo |
0.02 |
0.02 |
|
Nb |
0.1 |
0.1 |
|
Ni |
0.01 |
0.01 |
|
Si |
0.005 |
0.005 |
|
Ti |
0.01 |
0.01 |
|
W |
0.05 |
0.05 |
Tantalum Plate Specifications
| Condition: | Annealed |
|---|---|
| Size | Thickness: 0.07-10 mm |
| Width: 30-1000 mm | |
| Length: 30-3000 mm | |
| Material | UNS R05200, UNS R05400 |
| Standard | ASTM B708-98 |
| Purity | ≥99.95% or 99.99% |
Sizes/Tolerance(mm max)
| Thickness | Tolerance | Width | Tolerance | Length | Tolerance | |
|---|---|---|---|---|---|---|
| GradeⅠ | gradeⅡ | |||||
| ＞0.15-0.2 | ±0.015 | ±0.02 | 50-300 | ±2.0 | 100-1000 | ±2.0 |
| ＞0.2-0.3 | ±0.020 | ±0.03 | 50-300 | ±1.0 | 100-1000 | ±2.0 |
| ＞0.3-0.5 | ±0.030 | ±0.04 | 50-500 | ±1.0 | 100-1500 | ±2.0 |
| ＞0.5-0.8 | ±0.040 | ±0.06 | 50-500 | ±1.0 | 50-2000 | ±2.0 |
| ＞0.8-1.0 | ±0.060 | ±0.08 | 50-500 | ±1.0 | 50-2000 | ±2.0 |
| ＞1.0-1.5 | ±0.080 | ±0.10 | 50-500 | ±2.0 | 50-2000 | ±2.0 |
| ＞1.5-2.0 | ±0.120 | ±0.14 | 50-500 | ±2.0 | 50-2000 | ±2.0 |
| ＞2.0-3.0 | ±0.160 | ±0.18 | 50-500 | ±2.0 | 50-2000 | ±2.0 |
| ＞3.0-4.0 | ±0.180 | ±0.20 | 50-500 | ±1.0 | 50-1500 | ±1.0 |
| ＞4.0-6.0 | ±0.200 | ±0.24 | 50-350 | ±1.0 | 50-1500 | ±1.0 |
-
Properties
High Melting Point: 3017°C, making it suitable for extreme heat environments.
Density: 16.6 g/cm³, comparable to tungsten, providing durability.
Corrosion Resistance: Resistant to most acids (except hydrofluoric acid and hot sulfuric acid) and alkalis, even up to 150°C.
Biocompatibility: Non-reactive in bodily fluids, ideal for medical implants.
Ductility: Can be rolled into thin plates without cracking.
-
Applications
Chemical Processing: Heat exchangers, reactor linings, and cladding due to corrosion resistance.
Medical: Surgical tools, implants (e.g., bone repair plates), and imaging markers.
Electronics: Sputtering targets for semiconductor manufacturing; capacitors (using powder form).
Aerospace/Nuclear: Heat shields, rocket components, and nuclear reactor cladding.
-
Manufacturing
Production Methods: Vacuum arc melting or electron beam melting ensures high purity (≥99.95%).
Forming: Hot/cold rolling into plates; machining requires carbide tools due to toughness.
Welding: Performed under inert gases (argon/helium) to prevent oxidation.
Hot Tags: Pure Tantalum Plate (UNS R05200, ASTM B708), Tantalum Plate, UNS R05200, ASTM B708, Chemical Processing Plate, Medical Implant Plate, Semiconductor Plate, Sputtering Target Plate
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